Open Access Paper
10 December 2024 Front Matter: Volume 13423
Proceedings Volume 13423, Eighth International Workshop on Advanced Patterning Solutions (IWAPS 2024); 1342301 (2024) https://doi.org/10.1117/12.3056543
Event: 8th International Workshop on Advanced Patterning Solutions (IWAPS 2024), 2024, Jiaxing, Zhejiang, China
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 13423, including the Title Page, Copyright information, Table of Contents, and Conference Committee information.
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 13423", Proc. SPIE 13423, Eighth International Workshop on Advanced Patterning Solutions (IWAPS 2024), 1342301 (10 December 2024); https://doi.org/10.1117/12.3056543
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KEYWORDS
Extreme ultraviolet lithography

Advanced patterning

Electron beam lithography

Error analysis

Lithography

Optical proximity correction

Instrument modeling

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