Novel novolak resins using substituted phenols for high-performance positive photoresist

Toru Kajita; Toshiyuki Ota; Hiroaki Nemoto; Yoshiji Yumoto; Takao Miura

doi:10.1117/12.46367

1 June 1991 Novel novolak resins using substituted phenols for high-performance positive photoresist

Toru Kajita, Toshiyuki Ota, Hiroaki Nemoto, Yoshiji Yumoto, Takao Miura

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46367
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

The present paper describes the effects of methyl groups, substituted on aromatic rings of novolak resins, on positive photoresist characteristics. And some aspects of the dissolution mechanism of the novolak-quinonediazide resist system are also elucidated. We have found that the use of m-methyl substituted phenols, especially 3,5-dimethyl substituted phenols, is effective to increase the ratio of intra-/inter- molecular hydrogen bonds, and the ratio is controllable by selecting phenolic monomer composition. Our study has also revealed that there is an optimum range of the ratio for the resist performance, mainly depending on the PAC (Photo Active Compound)'s structure and the resin itself. In order to understand this phenomenon, we carried out several experiments in respect of the dissolution behavior of some selected novolak-inhibitor systems and found that the interaction between o-o units of the novolak resin and the NQD moiety in the PAC structure plays a important role on an alkaline dissolution mechanism. The resists adopting these novel novolak resins with the optimum hydrogen bond ratio show resolution of 0.34 micrometers L/S with excellent pattern profile on an i-line stepper (NA equals 0.50) and good thermal stability.

Citation Download Citation

Toru Kajita, Toshiyuki Ota, Hiroaki Nemoto, Yoshiji Yumoto, and Takao Miura "Novel novolak resins using substituted phenols for high-performance positive photoresist", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46367

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available