Simulation of connected image reversal and DESIRE techniques for submicron lithography

Dan V. Nicolau; Mircea V. Dusa; Florin Fulga

doi:10.1117/12.46414

1 June 1991 Simulation of connected image reversal and DESIRE techniques for submicron lithography

Dan V. Nicolau, Mircea V. Dusa, Florin Fulga

Author Affiliations +

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46414
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

The paper deals with the simulation of DESIRE, for which purpose a mathematical model is built which emphasizes the role of Tg in diffusion. Taking into consideration that Image Reversal amplifies the changes of the Tg and additionally improves the lithographic characteristics of the process, the authors propose two routes for connecting ImRe with DESIRE. The simulation's results are presented.

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Dan V. Nicolau, Mircea V. Dusa, and Florin Fulga "Simulation of connected image reversal and DESIRE techniques for submicron lithography", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46414

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