Polishing of filament-assisted CVD diamond films

Carolyn F. Hickey; Thomas P. Thorpe; Arthur A. Morrish; James E. Butler; C. Vold; Keith A. Snail

doi:10.1117/12.48281

1 December 1991 Polishing of filament-assisted CVD diamond films

Carolyn F. Hickey, Thomas P. Thorpe, Arthur A. Morrish, James E. Butler, C. Vold, Keith A. Snail

Proceedings Volume 1534, Diamond Optics IV; (1991) https://doi.org/10.1117/12.48281
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

A thermochemical polishing technique (using low carbon steel at 700 degree(s)C to 900 degree(s)C) was employed to reduce the roughness on the surface of diamond films from 20,000-40,000 angstroms rms to 30-45 angstroms rms. These polycrystalline films were grown by filament assisted chemical vapor deposition (FACVD) onto (100) oriented silicon substrates. SEM micrographs reveal etch pits in the films, and these limit the final polish which can be achieved. This paper show that the hot iron technique polishes a (111) oriented film, which is the hardest direction for abrasive polishing. Preliminary studies indicate that for chemical polishing there is no large difference between the polishing rates of diamond as a function of orientation.

Citation Download Citation

Carolyn F. Hickey, Thomas P. Thorpe, Arthur A. Morrish, James E. Butler, C. Vold, and Keith A. Snail "Polishing of filament-assisted CVD diamond films", Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); https://doi.org/10.1117/12.48281

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