Planar diffusion-based processes for the fabrication of integrated optical and electronic components

Robert L. Thornton

doi:10.1117/12.2321802

1 December 1992 Planar diffusion-based processes for the fabrication of integrated optical and electronic components

Robert L. Thornton

Proceedings Volume 1582, Integrated Optoelectronics for Communication and Processing; (1992) https://doi.org/10.1117/12.2321802
Event: OE Fiber, 1991, Boston, MA, United States

Abstract

The discovery of the phenomenon of impurity induced layer disordering (IILD) has enabled novel device geometries to be applied to the task of patterning heterostructure layers for the realization of high performance optoelectronic devices. In this paper we will review progress in the various ways of implementing and controlling the IILD process, and discuss several of the potentially important device concepts for optoelectronic integration that are enabled by this technology.

Citation Download Citation

Robert L. Thornton "Planar diffusion-based processes for the fabrication of integrated optical and electronic components", Proc. SPIE 1582, Integrated Optoelectronics for Communication and Processing, (1 December 1992); https://doi.org/10.1117/12.2321802

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