Application of atomic-force microscopy to phase-shift masks

Amalkumar P. Ghosh; Derek B. Dove; H. Kumar Wickramasinghe; R. Marshall Stowell; Ken Roessler

doi:10.1117/12.59839

1 June 1992 Application of atomic-force microscopy to phase-shift masks

Amalkumar P. Ghosh, Derek B. Dove, H. Kumar Wickramasinghe, R. Marshall Stowell, Ken Roessler

Proceedings Volume 1673, Integrated Circuit Metrology, Inspection, and Process Control VI; (1992) https://doi.org/10.1117/12.59839
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

In recent years, optical phase shifting masks (PSM) have become of interest for the enhancement of submicron lithographic techniques. Various schemes of PSMs have been published in the literature demonstrating improvement in performance of optical lithography techniques for 0.5 micrometers features and below. Some of these schemes require features on the PSMs that are micron or submicron in size. Monitoring the depth as well as the lateral dimensions of these small features is important in order to meet the dimensional tolerances. In this paper we report the application of an atomic force microscope (AFM) to obtain both quantitative as well as qualitative information about the etched features in a PSM.

Citation Download Citation

Amalkumar P. Ghosh, Derek B. Dove, H. Kumar Wickramasinghe, R. Marshall Stowell, and Ken Roessler "Application of atomic-force microscopy to phase-shift masks", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); https://doi.org/10.1117/12.59839

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