Advanced krypton fluoride excimer laser for microlithography

Toshihiko Ishihara; Richard L. Sandstrom; Christopher Reiser; Uday K. Sengupta

doi:10.1117/12.130343

1 June 1992 Advanced krypton fluoride excimer laser for microlithography

Toshihiko Ishihara, Richard L. Sandstrom, Christopher Reiser, Uday K. Sengupta

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130343
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

In this paper, we present performance, reliability, and maintainability data for the ELS-4000, a production-worthy, spectrally narrowed KrF excimer laser for wafer steppers. This laser uses the same modular design concept as its predecessor, the CX-2LS. The ELS-4000 exhibits the following specifications: (i) spectral bandwidth (FWHM) less than 2.0 pm; (ii) wavelength stability less than or equal to 0.25 pm; (iii) output power of 4 W at 400 Hz; (iv) pulse-to-pulse energy stability less than or equal to 2.5%; (v) fast and accurate wavelength slewing and locking capability; (vi) small footprint measuring 0.74 m by 1.36 m; (vii) mean productive time between failures exceeding 700 hours; and (viii) design and engineering features, which meet all the safety standards of the semiconductor industry.

Citation Download Citation

Toshihiko Ishihara, Richard L. Sandstrom, Christopher Reiser, and Uday K. Sengupta "Advanced krypton fluoride excimer laser for microlithography", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130343

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