Novel laser microlithography system

Guan-Qun Shen; Binchu Wu; Kangzhe Cai; Xuanshao Huang; Paiqi Cao

doi:10.1117/12.130358

1 June 1992 Novel laser microlithography system

Guan-Qun Shen, Binchu Wu, Kangzhe Cai, Xuanshao Huang, Paiqi Cao

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130358
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

A novelmicrolithographysystem with high precision and high performance is suggested in this paper. In the system, sub-micrometer focused laser beam was used to carve spot by spot on a disk, which was covered by photoresist and was mounted on a uniform turning stage. Pre-designed pattern can be obtained by two dimensional scanning which was realized by using a high precision turning stage and a high precision radial moving stage. The system has the advantages of high speed ( > 10meter sec for single laser beam), high precision (angle precision better than 0.2"), simple structure and using low price objective. We can not only make very large pattern (> 1011pixels), but also make a set of (eg. 5-6 pieces) masks using in LSIC production on one disk. Detailed principles and performances of the microlithography system will be introduced in this paper.

Citation Download Citation

Guan-Qun Shen, Binchu Wu, Kangzhe Cai, Xuanshao Huang, and Paiqi Cao "Novel laser microlithography system", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130358

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