Paper
14 January 1993 Application of concept selection methodology in IC process design
Myung-Kul Kim
Author Affiliations +
Proceedings Volume 1802, Microelectronics Manufacturing and Reliability; (1993) https://doi.org/10.1117/12.139339
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States
Abstract
Search for an effective methodology practical in IC manufacturing process development led to trial of quantitative 'concept selection' methodology in selecting the 'best' alternative for interlevel dielectric (ILD) processes. A cross-functional team selected multi-criteria with scoring guidelines to be used in the definition of the 'best'. The project was targeted for the 3 level metal backend process for sub-micron gate array product. The outcome of the project showed that the maturity of the alternatives has strong influence on the scores, because scores on the adopted criteria such as yield, reliability and maturity will depend on the maturity of a particular process. At the same time, the project took longer than expected since it required data for the multiple criteria. These observations suggest that adopting a simpler procedure that can analyze total inherent controllability of a process would be more effective. The methodology of the DFS (design for simplicity) tools used in analyzing the manufacturability of such electronics products as computers, phones and other consumer electronics products could be used as an 'analogy' in constructing an evaluation method for IC processes that produce devices used in those electronics products. This could be done by focusing on the basic process operation elements rather than the layers that are being built.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Myung-Kul Kim "Application of concept selection methodology in IC process design", Proc. SPIE 1802, Microelectronics Manufacturing and Reliability, (14 January 1993); https://doi.org/10.1117/12.139339
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KEYWORDS
Manufacturing

Reliability

Microelectronics

Dielectrics

Product engineering

Signal processing

Metals

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