Paper
10 December 1993 In-position optical surface measurement for x-ray projection lithography optics: theory and simulation
Eiichi Seya, Minoru Hidaka, Masaaki Ito, Souichi Katagiri, Eiji Takeda
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Abstract
A technique is proposed to measure x-ray projection optics. Simultaneous linear equations are derived from the wavefront distortions to obtain form errors of optical surfaces discretely. Simulations proved that the arithmetic operation errors are small enough to achieve nanometer level accuracy. This technique is effective to test aspheric reflectors, as well as the reflector misalignments. It also is able to be applied to adaptive optics compensating for thermal deformation effects or drifts on the exposure system.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eiichi Seya, Minoru Hidaka, Masaaki Ito, Souichi Katagiri, and Eiji Takeda "In-position optical surface measurement for x-ray projection lithography optics: theory and simulation", Proc. SPIE 2003, Interferometry VI: Techniques and Analysis, (10 December 1993); https://doi.org/10.1117/12.165471
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KEYWORDS
Adaptive optics

Reflectors

X-ray optics

X-rays

Optical testing

Wavefronts

Projection systems

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