Continuous-wave laser-assisted fabrication of microstructures in silicon microelectronics

Geoffroy Auvert

doi:10.1117/12.167544

1 February 1994 Continuous-wave laser-assisted fabrication of microstructures in silicon microelectronics

Geoffroy Auvert

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167544
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

The laser microchemical direct-write process is a powerful method to fabricate microstructures required for drawing interconnection networks in customized circuits and remodelling prototype circuits. The laser microchemical direct-write technique is presented by reviewing some laser-induced chemical reactions involved in the deposition of materials used in the microelectronics field. Investigation of the deposition of metals and silicon micrometer-size lines or dots using a cw argon-ion laser operating at wavelengths around 0.5 micrometers , is described. The growth kinetics, morphology and electrical resistivity of the deposits are studied in detail at various scanning speeds of the laser spot, laser beam powers and reactant gas pressures. Investigations of the kinetics of the chemical reactions allow us to propose reaction mechanisms for the decomposition of the reactive molecules used. On the basis of reported results, the use of the laser direct-write process as a tool for restructuring integrated circuits is presented.

Citation Download Citation

Geoffroy Auvert "Continuous-wave laser-assisted fabrication of microstructures in silicon microelectronics", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167544

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