Low-fluence laser excitation processes

Henry Helvajian; Lawrence Henry Wiedeman; H.-S. Kim

doi:10.1117/12.167540

1 February 1994 Low-fluence laser excitation processes

Henry Helvajian, Lawrence Henry Wiedeman, H.-S. Kim

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167540
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

Experimental results show that low-fluence UV laser irradiation induces non-thermal photosputtering from surfaces. The photophysical process is the result of surface electronic excitation and energy pooling at particular sites. We present data which show the preferential removal of arsenic from arsenic doped silicon and the role of plasmon excitation in the species desorption from thin metallic films. The observed phenomena has application in nanofabrication technology.

Citation Download Citation

Henry Helvajian, Lawrence Henry Wiedeman, and H.-S. Kim "Low-fluence laser excitation processes", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167540

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