Newly developed mask observation SEM JWS-7800

Kazuhiro Honda; Hiroshi Shimada; S. Norioka; Tatsuya Matsuo

doi:10.1117/12.191960

3 November 1994 Newly developed mask observation scanning electron microscope (SEM) JWS-7800

Kazuhiro Honda, Hiroshi Shimada, S. Norioka, Tatsuya Matsuo

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191960
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

Scanning electron microscopes (SEMs) are now coming into use as mask observation, metrology and defect inspection tools. Phase shift masks and X-ray masks are fabricated with several thin membranes on a substrate. In order to get 3D information about the membranes' structure, high tilt observation with high resolution is necessary. This paper describes a newly developed mask observation SEM (JWS-7800) which is intended for observation of various types of masks with high resolution, 10 nm at 1 kV acceleration, even at 60 degree(s) tilt angle.

Citation Download Citation

Kazuhiro Honda, Hiroshi Shimada, S. Norioka, and Tatsuya Matsuo "Newly developed mask observation scanning electron microscope (SEM) JWS-7800", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191960

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