Absorption of ArF-, KrF-, and Xef-laser radiation in optical materials at the moment of E-beam influence

V. S. Barabanov; P. B. Sergeyev

doi:10.1117/12.213745

14 July 1995 Absorption of ArF-, KrF-, and Xef-laser radiation in optical materials at the moment of E-beam influence

V. S. Barabanov, P. B. Sergeyev

Proceedings Volume 2428, Laser-Induced Damage in Optical Materials: 1994; (1995) https://doi.org/10.1117/12.213745
Event: Laser-Induced Damage in Optical Materials: 1994, 1994, Boulder, CO, United States

Abstract

The results of measurements of the optical density, induced at the moment of influence of the e-beam on crystal MgF₂, CaF₂, BaF₂, Al₂O₃, and also on different silica glasses, performed using laser radiation at 193, 248, and 353 nm, are presented and discussed.

Citation Download Citation

V. S. Barabanov and P. B. Sergeyev "Absorption of ArF-, KrF-, and Xef-laser radiation in optical materials at the moment of E-beam influence", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); https://doi.org/10.1117/12.213745

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available