Repair of photo- and x-ray masks by LCVD using nitrogen laser

Elena Fedorovna Reznikova; Vladimir V. Chesnokov; Galina I. Zharkova; Oleg A. Makarov; Vladimir P. Naz'mov; Igor K. Igumenov

doi:10.1117/12.209184

19 May 1995 Repair of photo- and x-ray masks by LCVD using nitrogen laser

Elena Fedorovna Reznikova, Vladimir V. Chesnokov, Galina I. Zharkova, Oleg A. Makarov, Vladimir P. Naz'mov, Igor K. Igumenov

Author Affiliations +

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209184
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The use of laser-induced chemical vapor deposition (LCVD) of chromium and rhenium film patterns for reporting of photomask defects and LCVD of rhenium, gold and platinum film pattern for repairing similar defects of X-ray masks was demonstrated. Initial compounds were Cr(CO)₆, Re₂(CO)₁₀, Me₂Au(dpm) and Pt(hfa)₂. The high marginal sharpness and the thickness uniformity of deposited films was provided by the use of powerful nanosecond pulse laser, the protective system for a delineation of a irradiation zone and the laser beam microscanning in limits of this zone. The scheme of the set for the direct laser deposition of film micropatterns was presented.

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Elena Fedorovna Reznikova, Vladimir V. Chesnokov, Galina I. Zharkova, Oleg A. Makarov, Vladimir P. Naz'mov, and Igor K. Igumenov "Repair of photo- and x-ray masks by LCVD using nitrogen laser", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209184

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