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Focused ion beam systems have traditionally used liquid gallium as the ion source material. It may now be possible to have high current density focused beams of gas ions like hydrogen, helium, neon, and oxygen. This paper discusses the progress recently made toward the commercialization of an alternative to gallium, the gas field ion source, or GFIS.
William B. Thompson,A. Armstrong,S. Etchin,Raymond Hill,Sigfried Kalbitzer,R. Percival,A. Saxonis, andChristoph Wilbertz
"Toward a commercial gas field ion source", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209185
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William B. Thompson, A. Armstrong, S. Etchin, Raymond Hill, Sigfried Kalbitzer, R. Percival, A. Saxonis, Christoph Wilbertz, "Toward a commercial gas field ion source," Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209185