Characterization of a laser plasma water droplet EUV source

Feng Jin; Martin C. Richardson; Gregory M. Shimkaveg; David Scott Torres

doi:10.1117/12.220999

18 September 1995 Characterization of a laser plasma water droplet EUV source

Feng Jin, Martin C. Richardson, Gregory M. Shimkaveg, David Scott Torres

Proceedings Volume 2523, Applications of Laser Plasma Radiation II; (1995) https://doi.org/10.1117/12.220999
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

We have configured a new type of target for laser plasma x-ray generation. This target consists of an in-vacuum flowing stream of liquid water droplets. We have successfully produced plasmas using this target, and have measured its extreme ultraviolet (EUV) emission spectrum. Bright lines from Li-like and He-like oxygen dominate in the plasma radiation in this region. Most importantly, not target debris related effects were observed for this type of target. A nearby Mo/Si multilayer EUV mirror suffered no reflectivity reduction at 13 nm after exposure to 10⁵ laser shots on target. This observation constitutes a major breakthrough in the utilization of laser plasma radiation for practical applications, in particular, for EUV projection lithography of advanced microelectronic circuits. The simplicity and versatility of a continuously-fed target with naturally smooth surface and no associated debris problems meshes strongly with the critical engineering required for envisioned production line EUV projection lithography installations. Additionally, through the use of water based solutions as targets, it should be possible to tailor the EUV emission spectrum to match the source requirements for other potential applications, such as the x-ray microscopy.

Citation Download Citation

Feng Jin, Martin C. Richardson, Gregory M. Shimkaveg, and David Scott Torres "Characterization of a laser plasma water droplet EUV source", Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); https://doi.org/10.1117/12.220999

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