Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH

Abdalla M. Darwish; Nickolai V. Kukhtarev; Robert R. Copeland; R. Sliz; Putcha Venkateswarlu; H. John Caulfield; Stephen Ducharme; James M. Takacs; Lei Zhang

doi:10.1117/12.217308

23 August 1995 Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH

Abdalla M. Darwish, Nickolai V. Kukhtarev, Robert R. Copeland, R. Sliz, Putcha Venkateswarlu, H. John Caulfield, Stephen Ducharme, James M. Takacs, Lei Zhang

Author Affiliations +

Proceedings Volume 2526, Xerographic Photoreceptors and Photorefractive Polymers; (1995) https://doi.org/10.1117/12.217308
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

We have observed the electron paramagnetic resonance (EPR) signal in the photorefractive polymer BisA-NAS:DEH. The polymer is a mixture of the electro-optic polymer bisphernol A 4,4-nitroaminostilbene (BisA-NAS) with 29% by weight benzaldehyde diphenyl-hydrazone (DEH), a hole transport agent. The EPR signal was observed at 3431.590 G. Illumination of the photorefractive polymer by an Ar⁺ laser leads to an interesting phenomenon. With an aim to understand the photosensitivity of the photorefractive polymer, we have monitored the changes in the intensity of the EPR line. The measurements were done in situ at room temperature and liquid nitrogen temperature 77 K. The sample was loaded in an optical transmission cavity to facilitate the use of the laser. When the sample is illuminating with low laser intensity, illumination decreases the EPR signal while for higher laser intensity, the EPR signal grows. We provide a tentative explanation for this phenomenon. Low laser intensity introduces photoconductivity, which reduces the EPR signal, but does not create free radicals. For higher laser intensity, paramagnetic free radicals are formed contributing to the increase of the EPR signal. The relation between observed phenomenon and photosensitivity will be discussed. Also the EPR results at low temperature will be presented.

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Abdalla M. Darwish, Nickolai V. Kukhtarev, Robert R. Copeland, R. Sliz, Putcha Venkateswarlu, H. John Caulfield, Stephen Ducharme, James M. Takacs, and Lei Zhang "Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH", Proc. SPIE 2526, Xerographic Photoreceptors and Photorefractive Polymers, (23 August 1995); https://doi.org/10.1117/12.217308

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KEYWORDS

Polymers

Photorefractive polymers

Temperature metrology

Signal detection

Electro optic polymers

Helium neon lasers

Argon ion lasers

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