Paper
27 May 1996 Peculiarities of the dynamics of the relief induced by two-beam laser interference on silicon surface near the melting threshold
Mikhail N. Libenson, Vladimir S. Makin, Yu. I. Pestov, Vladimir V. Trubaev
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Abstract
To study the material mechanisms of laser-induced silicon microrelief formation the periodic space-modulated heating up to melting point was used. On the basis of measurements of dynamics of surface thermal radiation and of the relief height the conclusion about material mechanisms of relief formation had been made.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mikhail N. Libenson, Vladimir S. Makin, Yu. I. Pestov, and Vladimir V. Trubaev "Peculiarities of the dynamics of the relief induced by two-beam laser interference on silicon surface near the melting threshold", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240426
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KEYWORDS
Silicon

Diffraction

Semiconductor lasers

Polishing

Pulsed laser operation

Crystals

Solids

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