Calibration of chemically amplified resist models

Jeff D. Byers; John S. Petersen; John L. Sturtevant

doi:10.1117/12.241875

14 June 1996 Calibration of chemically amplified resist models

Jeff D. Byers, John S. Petersen, John L. Sturtevant

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241875
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Chemically amplified (CA) resists are expected to provide the majority of the lithography capability for 0.25 micron feature sizes. The sensitivity of CA resists to processing conditions makes implementation of a resist system very dependent on the tool set (stepper, track, etc.) used. Modeling of these systems can be useful in optimizing a process for a particular tool set. However, the modeling parameters are also sensitive to the target tool set. Variations in dose calibration between different steppers, the differing temperature ramps found in contact and proximity bakes, and batch to batch variations between resist materials are examples why resist model parameters require calibration to each tool set. An ideal calibration procedure would entail in-situ measurement techniques at each processing step. The techniques would analytically determine chemical, physical, and kinetic quantities relevant to the resist system and processing conditions. Methods previously used have included interferometric measurement of photobleaching, FTIR measurement of the deprotection extent, in-situ DRM measurements, etc. Unfortunately, few if any fabs are equipped with the necessary in-situ techniques for complete model calibration.

Citation Download Citation

Jeff D. Byers, John S. Petersen, and John L. Sturtevant "Calibration of chemically amplified resist models", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241875

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available