Paper
24 July 1998 Control of a drop ejector used as a photoresist dispenser
Philippe E. Roche, Anders Hansson, Butrus T. Khuri-Yakub
Author Affiliations +
Abstract
Photo-resist dispensers traditionally apply a generous amount of resist on the wafer and then spin the wafer to reach a uniform desired thickness. With this technique, over 95% of expensive and hazardous liquid is wasted. The goal of this project is to reduce the waste by using a drop-on- demand ejection technology to apply the photo-resist. In practice, a controller turns out to be necessary to compensate for the variability of the performance of the ejectors, to insure the stability of the ejection, and to speed up the transient regime for drop-on-demand operation. The paper reports on the design and simulation of this controller.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philippe E. Roche, Anders Hansson, and Butrus T. Khuri-Yakub "Control of a drop ejector used as a photoresist dispenser", Proc. SPIE 3323, Smart Structures and Materials 1998: Mathematics and Control in Smart Structures, (24 July 1998); https://doi.org/10.1117/12.316324
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Device simulation

Oscillators

Semiconducting wafers

Capacitance

Feedback control

Photoresist materials

Coating

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