ICP quartz etch uniformity improvement for phase-shift mask fabrication

Chris Constantine; L. Heckerd

doi:10.1117/12.328810

1 September 1998 ICP quartz etch uniformity improvement for phase-shift mask fabrication

Chris Constantine, L. Heckerd

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328810
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

The Quartz etch improvement program is established to technically understand and ascertain the limits, hardware implications and process conditions associated with the etching of Quartz Photomasks. This study explores several process parameters as well as salient hardware changes and ultimately analyzes results by etching test Photomasks as well as a test structure closely emulating a Levenson-style Phase Shift Photomask.

Citation Download Citation

Chris Constantine and L. Heckerd "ICP quartz etch uniformity improvement for phase-shift mask fabrication", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328810

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