Advanced mask printability analysis using TINT Virtual Stepper System

Darren Taylor; Richard D. Eandi

doi:10.1117/12.332869

18 December 1998 Advanced mask printability analysis using TINT Virtual Stepper System

Darren Taylor, Richard D. Eandi

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332869
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

Zygo Advanced Imaging Group's TINT Virtual Stepper Defect Analysis System's ability to predict CD printability of various known features on photomasks is tested. These features are analyzed with the TINT Virtual Stepper (VSS) software using known stepper parameters, and subsequently printed using a stepper with the same parameters. CD measurements, SEM imaging, and CD SEM analysis of the feature sites are compared to determine the ability of the TINT Virtual Stepper to accurately simulate feature CD printability.

Citation Download Citation

Darren Taylor and Richard D. Eandi "Advanced mask printability analysis using TINT Virtual Stepper System", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332869

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