Preparation of lower-dispersity fractionated novolak resins by ultracentrifugation

Douglas S. McKenzie; Michelle M. Cook; M. Dalil Rahman; Stan F. Wanat; Melodie I. Munoz; Robert K. Fea; Balaji Narasimhan

doi:10.1117/12.350148

11 June 1999 Preparation of lower-dispersity fractionated novolak resins by ultracentrifugation

Douglas S. McKenzie, Michelle M. Cook, M. Dalil Rahman, Stan F. Wanat, Melodie I. Munoz, Robert K. Fea, Balaji Narasimhan

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350148
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The need to make well characterized resins consistently is paramount to the preparation of high performance photoresists. Solid resins fractionated by selective precipitation have been separated by ultracentrifugation at varying temperatures. At sufficiently high revolutions per minute, solvents and oligomers are efficiently squeezed out leaving behind polymer with higher average molecular weight and lower dispersity than resins obtained by more common isolation techniques. By controlling isolation conditions, resins with desired dissolution rates could be produced. Lithographic test confirmed that resists properties could effectively be controlled by manipulation of process conditions to isolate resins used in the formulations.

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Douglas S. McKenzie, Michelle M. Cook, M. Dalil Rahman, Stan F. Wanat, Melodie I. Munoz, Robert K. Fea, and Balaji Narasimhan "Preparation of lower-dispersity fractionated novolak resins by ultracentrifugation", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350148

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