Paper
15 November 1999 Mesh-equipped Wehnelt source for SCALPEL
Victor Katsap, Warren K. Waskiewicz, Peter B. Sewell, John A. Rouse
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Abstract
The SCALPEL E-beam lithography tool requires an extremely uniform, high emittance E-beam to illuminate the Mask. The existing SCALPEL source utilizes a pure metal cathode operating in the temperature limited mode, thus having limited total emission current available. The usable emitter size of this cathode is constrained by its direct heating scheme, which sets an upper limit for the beam emittance. Furthermore, to generate a uniform beam, a conventional source should be designed to have a high cut-off voltage, which precludes an efficient electronic beam current control. We have studied the possibility of implementing a large area flat cathode and fine control grid mesh combination, potentially capable of providing high emission uniformity, high beam current and low beam control voltage.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Victor Katsap, Warren K. Waskiewicz, Peter B. Sewell, and John A. Rouse "Mesh-equipped Wehnelt source for SCALPEL", Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); https://doi.org/10.1117/12.370117
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KEYWORDS
Charged-particle lithography

Beam controllers

Computer simulations

Charged particle optics

Electron beam lithography

Electron beams

Metals

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