Surface etch-front morphologies using in-plane light scattering

Yiping -P. Zhao; G. -C. Wang; Toh-Ming Lu

doi:10.1117/12.366715

25 October 1999 Surface etch-front morphologies using in-plane light scattering

Yiping -P. Zhao, G. -C. Wang, Toh-Ming Lu

Proceedings Volume 3784, Rough Surface Scattering and Contamination; (1999) https://doi.org/10.1117/12.366715
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

By using a diode array detector and an in-plane scattering geometry, we have investigated the diffraction from various etch-front morphologies. We can obtain an angular distribution of light intensity profile within 30 milliseconds. A series of experimental work, including the detailed characterization of Si backside surfaces and the morphology of Al films on Si during chemical corrosion, will be presented. The corresponding roughness parameters for different surfaces were extracted from light scattering profiles, and compared with those from real-space images. Real time measurements have been performed to study the evolution of Si surface morphology during wet chemical etching. RMS roughness, pits density, correlation length, and pits formation rate can be determined in real time.

Citation Download Citation

Yiping -P. Zhao, G. -C. Wang, and Toh-Ming Lu "Surface etch-front morphologies using in-plane light scattering", Proc. SPIE 3784, Rough Surface Scattering and Contamination, (25 October 1999); https://doi.org/10.1117/12.366715

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