Cost analysis of 4x and 6x 9-in. reticles for future lithography

Lloyd C. Litt; Michael E. Kling; Terry Perkinson

doi:10.1117/12.373319

30 December 1999 Cost analysis of 4x and 6x 9-in. reticles for future lithography

Lloyd C. Litt, Michael E. Kling, Terry Perkinson

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373319
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

Standardizing on reticle size is critical for semiconductor tool manufacturers and the semiconductor industry as a whole. The advantages of large reticles are well known: larger die and increased throughput. Although predictions of extremely large die have not yet been realized, the throughput implications remain valid. As large reticles have the potential to increase throughput, some proponents view them as potential cost savers. This work examines the implications of migrating from today's standard 6-inch reticles to 9-inch reticles. It explores the factors that drive reticle cost, and describes why larger reticles should cost more. The paper also describes the cost benefit of implementing larger masks. Comparing the expected cost of building the reticle to the potential cost savings of using the reticle in production provides significant insight into the problem of selecting the optimal reticle size. Finally, the paper presents an analysis of the impact of 6X reduction systems on the selection of reticle size.

Citation Download Citation

Lloyd C. Litt, Michael E. Kling, and Terry Perkinson "Cost analysis of 4x and 6x 9-in. reticles for future lithography", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373319

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