Output stabilization technology with chemical impurity control on ArF excimer laser

Akira Sumitani; Satoshi Andou; Takehito Watanabe; Masayuki Konishi; Suguru Egawa; Ikuo Uchino; Takeshi Ohta; Katsutomo Terashima; Natsushi Suzuki; Tatsuo Enami; Hakaru Mizoguchi

doi:10.1117/12.388980

5 July 2000 Output stabilization technology with chemical impurity control on ArF excimer laser

Akira Sumitani, Satoshi Andou, Takehito Watanabe, Masayuki Konishi, Suguru Egawa, Ikuo Uchino, Takeshi Ohta, Katsutomo Terashima, Natsushi Suzuki, Tatsuo Enami, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388980
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Based on accurate gas analysis technology it has been found that both gas purity and gas control are key factors in optimizing the performance of ArF excimer lasers. The study of the behavior of gas impurities inside the laser chamber showed that impurities built up not only during laser operation but also during rest periods. In-situ gas analysis and controlled impurity gas addition clarified that hydrogen fluoride and oxygen impurities, are the main causes for the decrease of laser output energy. Based on our experiments, a modified gas composition was chosen for the ArF laser that significantly improved its output characteristics.

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Akira Sumitani, Satoshi Andou, Takehito Watanabe, Masayuki Konishi, Suguru Egawa, Ikuo Uchino, Takeshi Ohta, Katsutomo Terashima, Natsushi Suzuki, Tatsuo Enami, and Hakaru Mizoguchi "Output stabilization technology with chemical impurity control on ArF excimer laser", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388980

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