Simulation study of multiple acceptable models existing in the interpretation of ellipsometric data

Wensheng Guo

doi:10.1117/12.408328

29 November 2000 Simulation study of multiple acceptable models existing in the interpretation of ellipsometric data

Wensheng Guo

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408328
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

Ellipsometry has been widely used in the measurements of thin film thickness and optical properties. The existence of multiple acceptable models has been confirmed in the interpretation of the measured ellipsometric data, which can degrade the measurement accuracy. How to eliminate this ambiguity is very important. In the present paper, we apply a simulation method to study the existence of multiple acceptable models and to seek the methods to alleviate such kinds of ambiguity. In the simulation study, a simple structure model (silicon dioxide film coated on silicon substrate) is used.

Citation Download Citation

Wensheng Guo "Simulation study of multiple acceptable models existing in the interpretation of ellipsometric data", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408328

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available