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23 August 2000 Toward 100% yield understanding approach in Lucent Technologies Madrid
Miguel Recio, Miguel Alonso Merino, Carlos Mata, Victorino Martin Santamaria, Jose Angel Ayucar, Julian Moreno, Agustin Godino, Alfonso Lorenzo, Ana Sacedon, Rosa Fernandez, Carmen Morilla, Jesus Inarrea, Manuel Alvarez, Almudena Fernandez, K. Therryl, Carlos Mateos, Gerardo Gonzalez, Sergio Cruceta, J. Castano
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Proceedings Volume 4182, Process Control and Diagnostics; (2000) https://doi.org/10.1117/12.410071
Event: Microelectronic Manufacturing, 2000, Santa Clara, CA, United States
Abstract
A wealth of advantages arise form breaking down the overall yield into yield components that are easier to work and closer to the manufacturing line environment. We present in this paper our strategy to attempt the 100 percent yield explanation on our fab and the process of building a pareto that quantifies the impact of each yield component. The most critical one, the defect related, is accounted by a set of knowledge-based automatic software tools that operate in our fab. They quantify it and break it down into the by layer, by defect size and type contributions. The step forward of communication and deployment of this yield strategy is a key topic also discussed in the paper. On our way towards the 100 percent understanding of yield we have learned how to better manage it and taken advantage of many more opportunities to improve it. The strategy has shown to work both for new and mature technologies in our manufacturing line in Lucent Technologies Madrid.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Miguel Recio, Miguel Alonso Merino, Carlos Mata, Victorino Martin Santamaria, Jose Angel Ayucar, Julian Moreno, Agustin Godino, Alfonso Lorenzo, Ana Sacedon, Rosa Fernandez, Carmen Morilla, Jesus Inarrea, Manuel Alvarez, Almudena Fernandez, K. Therryl, Carlos Mateos, Gerardo Gonzalez, Sergio Cruceta, and J. Castano "Toward 100% yield understanding approach in Lucent Technologies Madrid", Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); https://doi.org/10.1117/12.410071
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KEYWORDS
Semiconducting wafers
Manufacturing
Inspection
Software development
Yield improvement
Defect detection
Failure analysis
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