Excimer laser as a total light source solution for DUV microlithography

Palash P. Das

doi:10.1117/12.414082

25 January 2001 Excimer laser as a total light source solution for DUV microlithography

Palash P. Das

Author Affiliations +

Proceedings Volume 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (2001) https://doi.org/10.1117/12.414082
Event: XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 2000, Florence, Italy

Abstract

Excimer lasers are now being used in the manufacturing ofultra-large scale integrated devices that require feature widths ofless than O.25?m. The excimer laser for microlithography, since its introduction in 1987 has evolved from a laboratory instrument to a manufacturing tool. We will trace the history of the excimer laser in this industry and explain why it is and remains the total solution for the present and for many years in the future.

Citation Download Citation

Palash P. Das "Excimer laser as a total light source solution for DUV microlithography", Proc. SPIE 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (25 January 2001); https://doi.org/10.1117/12.414082

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