Paper
12 February 2001 Analysis of error and development of calibration's method to design precision rotating analyzer ellipsometer
HyeonOk Gil, Sunglim Park, Jaewha Jung, Dae gab Gweon
Author Affiliations +
Proceedings Volume 4190, Optomechatronic Systems; (2001) https://doi.org/10.1117/12.417215
Event: Intelligent Systems and Smart Manufacturing, 2000, Boston, MA, United States
Abstract
12 In manufacturing a rotating-analyzer ellipsometer, error sources and calibration methods are discussed. It is important to get rid of external noise for measurement of high thickness resolution and accurate optical constant and this means that the precision of system above all is important to develop the ellipsometer. Therefore the precision design and error calibration of the optical components in ellipsometer are inevitable. We propose a PSA (polarizer-specimen-analyzer) system to manufacture a rotating-analyzer ellipsometer.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
HyeonOk Gil, Sunglim Park, Jaewha Jung, and Dae gab Gweon "Analysis of error and development of calibration's method to design precision rotating analyzer ellipsometer", Proc. SPIE 4190, Optomechatronic Systems, (12 February 2001); https://doi.org/10.1117/12.417215
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KEYWORDS
Error analysis

Calibration

Manufacturing

Optical calibration

Optical components

Optical resolution

Opto mechatronics

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