Laser ablation of solid nitrogen films at a cryogenic temperature

Hiroyuki Niino; Tadatake Sato; Akira Yabe

doi:10.1117/12.432513

29 June 2001 Laser ablation of solid nitrogen films at a cryogenic temperature

Hiroyuki Niino, Tadatake Sato, Akira Yabe

Proceedings Volume 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI; (2001) https://doi.org/10.1117/12.432513
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

Photo-dissociation and laser ablation of solid nitrogen film at 10 K was carried out upon irradiation with a picosecond UV laser (FHG of Nd:YLF laser; 263 nm, 8 ps, 10 Hz) in vacuum. The optical emission lines, attributed to molecular and atomic nitrogen of the film, were monitored by a time-resolved spectroscopic technique. The mechanism of these processes was discussed on the basis of multi-photon absorption of molecular nitrogen.

Citation Download Citation

Hiroyuki Niino, Tadatake Sato, and Akira Yabe "Laser ablation of solid nitrogen films at a cryogenic temperature", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432513

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