Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Francis M. Houlihan; Zhenglin Yan; Elsa Reichmanis; Gary Dabbagh; Kevin J. Bolan; Omkaram Nalamasu; Ilya L. Rushkin; Ognian N. Dimov

doi:10.1117/12.436904

24 August 2001 Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Francis M. Houlihan, Zhenglin Yan, Elsa Reichmanis, Gary Dabbagh, Kevin J. Bolan, Omkaram Nalamasu, Ilya L. Rushkin, Ognian N. Dimov

Author Affiliations +

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436904
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

We report on a lithographic study of the behavior of non- cholate tert-butylcarboxylate dissolution inhibitor (DI's) formulated in a poly(norbornene/maleic anhydride/acrylic acid/tert-butyl acrylate) 193 nm single layer resin. A comparision is made between formulations containing non- cholate DI's, cholate based DI's and formulations containing blends of the two different types of DI's. It was found that formulations containing the non-cholate materials tended to give T-topped profiles while the formulations containing cholate based materials and blends containing as little as 1% cholate based DI did not.

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Francis M. Houlihan, Zhenglin Yan, Elsa Reichmanis, Gary Dabbagh, Kevin J. Bolan, Omkaram Nalamasu, Ilya L. Rushkin, and Ognian N. Dimov "Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436904

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