Paper
9 April 2002 CO2-laser polishing for reductoin of 351-nm surface damage initiation in fused silica
Raymond M. Brusasco, Bernie M. Penetrante, Jim A. Butler, Stephen M. Maricle, John Peterson
Author Affiliations +
Abstract
We have applied a carbon dioxide (CO2) raster scanning laser polishing technique on two types of fused silica flat optics to determine the efficacy of CO2-laser polishing as a method to increase the 351-nm laser damage resistance of optic surfaces. R-on-1 damage test results show that the fluence for any given 355-nm damage probability is 10-15 J/cm2 higher (at 3 ns pulse length, scaled) for the CO2-laser polished samples. Poor quality and good quality surfaces respond to the treatment such that their surface damage resistance is brought to approximately the same level. Surface stress and the resultant effect on wavefront quality remain key technology issues that would need to be addressed for a robust deployment.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Raymond M. Brusasco, Bernie M. Penetrante, Jim A. Butler, Stephen M. Maricle, and John Peterson "CO2-laser polishing for reductoin of 351-nm surface damage initiation in fused silica", Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); https://doi.org/10.1117/12.461720
Lens.org Logo
CITATIONS
Cited by 21 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Surface finishing

Polishing

Carbon dioxide lasers

Laser induced damage

Failure analysis

Resistance

Silica

Back to Top