Design and development of a measurement and control system for measuring SEM magnification calibration samples

Bradley N. Damazo; E. C. Jayewardene; William J. Keery; Andras E. Vladar; Michael T. Postek Jr.

doi:10.1117/12.473445

16 July 2002 Design and development of a measurement and control system for measuring SEM magnification calibration samples

Bradley N. Damazo, E. C. Jayewardene, William J. Keery, Andras E. Vladar, Michael T. Postek Jr.

Author Affiliations +

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473445
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The National Institute of Standards and Technology (NIST) has provided industry with a scanning electron microscope (SEM) magnification calibration sample Reference Material (RM) 8090. The certified, Standard Reference Material (SRM) version, SRM 2090 is currently being prepared for issuance. This paper describes the design and development of a new, PC-based measurement and control system developed to facilitate the certification of the SRM 2090 artifact samples in a specialized metrology microscope. SRM 2090 is certified by moving the sample under a finely focused stationary electron beam in the metrology electron microscope. Using a laser interferometer with displacement measurements traceable to basic wavelength standards, the motion is measured while recording the secondary or backscattered electron output signal. A computer controls the motion, records the signal and interferometer value, then calculates the accurate spacing of the features, completes the statistical work and generates the NIST certificate. The original measurement system design was developed in the early 1990s. This paper outlines the effort to upgrade the system, including the replacement of the outdated measurement and control system with a new, LabVIEW based measurement and control system. The details of the new measurement and control system will be discussed and results will be presented.

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Bradley N. Damazo, E. C. Jayewardene, William J. Keery, Andras E. Vladar, and Michael T. Postek Jr. "Design and development of a measurement and control system for measuring SEM magnification calibration samples", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473445

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KEYWORDS

Scanning electron microscopy

Control systems design

Control systems

Calibration

Interferometers

Metrology

Motion measurement

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