Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Ralph R. Dammel; Raj Sakamuri; Sang-Ho Lee; Dalil Rahman; Takanori Kudo; Andrew R. Romano; Larry F. Rhodes; John-Henry Lipian; Cheryl Hacker; Dennis A. Barnes

doi:10.1117/12.474196

24 July 2002 Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Ralph R. Dammel, Raj Sakamuri, Sang-Ho Lee, Dalil Rahman, Takanori Kudo, Andrew R. Romano, Larry F. Rhodes, John-Henry Lipian, Cheryl Hacker, Dennis A. Barnes

Author Affiliations +

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474196
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The copolymerization reaction between methyl cyanoacrylate (MCA) and a variety of cycloolefins (CO) was investigated. Cycololefin/cyanoacrylate (COCA) copolymers were obtained in good yields and with lithographically interesting molecular weights for all cycoolefins studied. Anionic MCA homopolymerization could be largely suppressed using acetic acid. Based on NMR data, the copolymerization may tend to a 1:1 CO:MCA incorporation ratio but further work with better suppression of the anionic component is needed to confirm this. Lithographic tests on copolymers of appropriately substituted norbornenes and MCA showed semi-dense and isolated line performance down to 90 nm.

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Ralph R. Dammel, Raj Sakamuri, Sang-Ho Lee, Dalil Rahman, Takanori Kudo, Andrew R. Romano, Larry F. Rhodes, John-Henry Lipian, Cheryl Hacker, and Dennis A. Barnes "Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474196

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