Improved adhesion of photoresist to III-V substrates using PECVD carbon films

David P. Mancini; Steven M. Smith; Andrew F. Hooper; A. Talin; Daniel Chang; Douglas J. Resnick; Steven A. Voight

doi:10.1117/12.474642

30 July 2002 Improved adhesion of photoresist to III-V substrates using PECVD carbon films

David P. Mancini, Steven M. Smith, Andrew F. Hooper, A. Talin, Daniel Chang, Douglas J. Resnick, Steven A. Voight

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474642
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Amorphous PECVD carbon films have been investigated as a means to prepare III-V compound semiconductor substrates for improved photoresist adhesion. Results show that significant improvements in adhesive durability of patterned photoresist occurred for carbon primed GaAs and InGaAs wafers used in conjunction with both i-line and DUV lithography processes. These carbon layers, were 50-100 Angstrom in thickness, and varied in composition and morphology from a nitrogen-doped, diamond-like material (DLC), to a more hydrogen rich, polymer-like material (PLC). Adhesion durability tests performed in baths of ammonium hydroxide (NH₄OH) and hydrochloric acid (HCl) in general showed superior performance compared to non-primed substrates. The sole exception was a failure of PLC priming on GaAs wafers used with a DUV anti-reflective coating. This same system, however, was shown to work extremely well when a DLC coating was substituted. Characterization of PLC and DLC films included use of AES, XPS, FTIR, AFM, and contact angle analysis. Results indicate that carbon films passivate III-V oxides, creating a stable, hydrophobic surface. This factor is proposed as a key reason for the improved resistance to aggressive aqueous environments. AFM results show that carbon films are extremely smooth and actually decrease surface roughness, indicating that mechanical adhesion is unlikely.

Citation Download Citation

David P. Mancini, Steven M. Smith, Andrew F. Hooper, A. Talin, Daniel Chang, Douglas J. Resnick, and Steven A. Voight "Improved adhesion of photoresist to III-V substrates using PECVD carbon films", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474642

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