Paper
1 April 2003 Electron gun model for technological and microscopical applications
O. D. Potapkin
Author Affiliations +
Proceedings Volume 5025, Fifth Seminar on Problems of Theoretical and Applied Electron and Ion Optics; (2003) https://doi.org/10.1117/12.497620
Event: Fifth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, 2001, Moscow, Russian Federation
Abstract
New hybrid model for three electrodes gun was developed. It was called as Equivalent Cylinder Model (ECM). It allows to find field distribution and its derivatives analytically and gives useful information about electron gun paraxial properties as well as nonparaxial ones. The aberrations coefficients dependence on bias values was calculated. Current density radial distributions are discussed briefly. This model can be useful for design of devices working under Koehler mode.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
O. D. Potapkin "Electron gun model for technological and microscopical applications", Proc. SPIE 5025, Fifth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, (1 April 2003); https://doi.org/10.1117/12.497620
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Cited by 2 scholarly publications.
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KEYWORDS
Electrodes

Charged-particle lithography

Electron microscopes

Magnetism

Monochromatic aberrations

Distance measurement

Distortion

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