Direct femtosecond laser writing system for sub-micron and micron scale patterning

Egidijus Vanagas; Dmitry Tuzhilin; Michail Zinkou; Alexander Sedunov; Nikolai Vasiliev; Igor Kudryashov; Vladimir Kononov; Shozi Suruga

doi:10.1117/12.540538

18 November 2003 Direct femtosecond laser writing system for sub-micron and micron scale patterning

Egidijus Vanagas, Dmitry Tuzhilin, Michail Zinkou, Alexander Sedunov, Nikolai Vasiliev, Igor Kudryashov, Vladimir Kononov, Shozi Suruga

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Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540538
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany

Abstract

Commercial femtosecond micromachining system (FMS) has been developed that capable to process the material in sub-micron (< 200 nm) and micron scale. Core of the system are: optical unit, controller unit and software. The other parts: fs-laser system; focusing unit; stage unit can be varied (exchangeable). Two different fs-laser systems already are compatible with core of FMS: Mira/RegA (Coherent) and Hurricane (Spectra-Physics). FMS controller unit allows to control every single fs-pulse delivery on the target. Three possible types of focusing unit are available: microscope type unit, long focal distance lens unit, and axicon lens based unit. Standard stage unit options are: three-axis piezostage, and two-axis air bearing stage combined with Z-axis piezostage. Repeatability for all dimensions is within ±5 nm. Also, step motor stages are available. The system allows 3D scan with confocal laser-microscope (resolution δr=200nm, δz=540nm) build in optical unit. Software controls all basic functions of the system performance and writing any pattern (including 3D) on or into specimen. The results obtained by direct fs-laser writing method are presented and discussed: bits in the range of 100 - 200 nm sizes, 6 TB/cm³ density optical storage matrix, waveguides fabrication inside transparent materials, high aspect ratio (1:125) patterning of dielectric materials with Gauss-Bessel beam.

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Egidijus Vanagas, Dmitry Tuzhilin, Michail Zinkou, Alexander Sedunov, Nikolai Vasiliev, Igor Kudryashov, Vladimir Kononov, and Shozi Suruga "Direct femtosecond laser writing system for sub-micron and micron scale patterning", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.540538

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KEYWORDS

Femtosecond phenomena

Optical lithography

Fermium

Frequency modulation

Confocal microscopy

Microscopes

Axicons

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