Paper
18 November 2003 Rotational micromachining tool controlled by optical radiation pressure
Yasuhiro Hidaka, Takashi Miyoshi, Yasuhiro Takaya, Tetsuo Sasaki, Kenji Shirai
Author Affiliations +
Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540508
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany
Abstract
This paper describes a new approach for micromachining using optical radiation pressure, which can not only trap and manipulate, but also rotate a dielectric particle with micrometer size. In order to verify the feasibility of our proposed micromachining, we fabricated a shuttlecock optical rotator as a rotational micromachining tool from a silica particle (5μm in diameter) by focused ion beam (FIB). Fundamental experiments were performed about the influence of focus point and laser power on the rotational properties of the machining tool. Furthermore, by traversing the rotating tool over the silicon wafer surface, it was found that the micro groove with several nm in depth could be generated.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuhiro Hidaka, Takashi Miyoshi, Yasuhiro Takaya, Tetsuo Sasaki, and Kenji Shirai "Rotational micromachining tool controlled by optical radiation pressure", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.540508
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KEYWORDS
Micromachining

Particles

Silicon

Optical trapping

Semiconducting wafers

Wafer-level optics

Silica

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