Novel pulse-repetitive technological CO2 laser for nanopowders and thin film production

M. G. Ivanov; V. V. Osipov; V. V. Platonov; V. V. Lisenkov; Y. A. Kotov

doi:10.1117/12.515839

10 November 2003 Novel pulse-repetitive technological CO₂ laser for nano-powders and thin film production

M. G. Ivanov, V. V. Osipov, V. V. Platonov, V. V. Lisenkov, Y. A. Kotov

Proceedings Volume 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2003) https://doi.org/10.1117/12.515839
Event: XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2002, Wroclow, Poland

Abstract

The paper reports about a new pulse-repetitive high-efficient technological CO₂-laser and its applications. An original method of active medium excitation was used for laser pumping. Efficiency of the laser constructed on the basis of this method reached 12%, average radiation power 600 W, pulse power ~ 10 kW. The laser was used for YSZ powders production by successive evaporation and crystallization in the gas stream. The output rate was 15-20g/h, specific surface of the powder was up to 70m²/g. Evaporation of materials by CO₂ laser was also used for ZrO₂ and Al₂O₃ thin films deposition on stainless steel plates. The average thickness of the film was ~500nm, the deposition rate was ~10nm on the area ~1cm² per pulse. The deposited films have high adhesion properties.

Citation Download Citation

M. G. Ivanov, V. V. Osipov, V. V. Platonov, V. V. Lisenkov, and Y. A. Kotov "Novel pulse-repetitive technological CO₂ laser for nano-powders and thin film production", Proc. SPIE 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (10 November 2003); https://doi.org/10.1117/12.515839

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