Silicon carbide micro- and nanoelectromechanical systems

Mehran Mehregany; Christian A. Zorman

doi:10.1117/12.548920

30 December 2003 Silicon carbide micro- and nanoelectromechanical systems

Mehran Mehregany, Christian A. Zorman

Proceedings Volume 5342, Micromachining and Microfabrication Process Technology IX; (2003) https://doi.org/10.1117/12.548920
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

Micro-and nanoelectromechanical systems (MEMS and NEMS) enable the development of smart products and systems by augmenting the computational ability of microelectronics with perception and control capabilities of micro/nanosensors and micro/nanoactuators. Silicon carbide (SiC) is well known for its excellent properties, making it an outstanding candidate as a structural material for MEMS and NEMS. This paper reviews some of the more significant accomplishments by our group in developing the 3C- polytype of SiC for MEMS and NEMS. Forming the cornerstone of this effort are two key thin film deposition systems that are used to deposit single crystalline and polycrystalline 3C-SiC films for bulk and surface micromachined devices. This paper presents an overview of these two deposition systems, their applicability in MEMS, as well as specific devices that have been fabricated using films from these reactors.

Citation Download Citation

Mehran Mehregany and Christian A. Zorman "Silicon carbide micro- and nanoelectromechanical systems", Proc. SPIE 5342, Micromachining and Microfabrication Process Technology IX, (30 December 2003); https://doi.org/10.1117/12.548920

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