A novel and robust method for the accurate magnification characterization and calibration of out-of-fab SEM cluster tools

Al Sicignano; Arkady Nikitin; Dmitry Yeremin; Tim Goldburt; Bryan Tracy

doi:10.1117/12.536047

24 May 2004 A novel and robust method for the accurate magnification characterization and calibration of out-of-fab SEM cluster tools

Al Sicignano, Arkady Nikitin, Dmitry Yeremin, Tim Goldburt, Bryan Tracy

Author Affiliations +

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.536047
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Precision can no longer be disassociated from accuracy. In fact, the two parameters must go hand in hand in the current 100 nm and below metrology environment. Therefore stating that "precision is more important than accuracy" does not capture the criticality of measurements of logic and memory chips with critical dimensions (CD) of 100 nm and below. The ITRS roadmap continues to set attainable milestones, calling for CD measurements with 3 σ to fall within a 0.9 nm error budget for the 100 nm mode, translating to ±0.9%. This implies tool calibration precision of 0.1% for 3σ. The methods in the industry today avoid both precision and accuracy and therefore cannot achieve the ITRS requirements. The resultant low precision and no accuracy in the SEM measurements lead to 'matching' and 'offset tables' that waste time, lose efficiency and potentially produce lower yield. Nanometrology's integrated system, NanoCal, a software/hardware product offers the first opportunity to combine both precision and accuracy in SEM magnification calibration. Using NanoCal in this work, we report that out of fab SEMs can be calibrated to 0.1% precision and 1 nm accuracy.

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Al Sicignano, Arkady Nikitin, Dmitry Yeremin, Tim Goldburt, and Bryan Tracy "A novel and robust method for the accurate magnification characterization and calibration of out-of-fab SEM cluster tools", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.536047

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