Advances in the use of birefringence to measure laser-induced density changes in fused silica

Johannes Moll; Douglas C. Allan; Ulrich Neukirch

doi:10.1117/12.534286

28 May 2004 Advances in the use of birefringence to measure laser-induced density changes in fused silica

Johannes Moll, Douglas C. Allan, Ulrich Neukirch

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.534286
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Birefringence mapping of fused silica samples is used to measure density change in the material after exposure to excimer laser radiation. The proper techniques and methods that should be used to perform the exposure of the samples and the analysis of the birefringence results will be discussed. The quantitative analysis of birefringence measurements includes the correct subtraction of the initial birefringence of the sample and the comparison with a theoretical birefringence map calculated for a 1 ppm unconstrained density change under consideration of material and exposure parameters. Proper experimental conditions include the use of samples with low initial birefringence and a round circularly polarized laser beam with top-hat intensity profile.

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Johannes Moll, Douglas C. Allan, and Ulrich Neukirch "Advances in the use of birefringence to measure laser-induced density changes in fused silica", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.534286

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