Lithography-based automation in the design of program defect masks

George P. Vakanas; Saghir Munir; Edita Tejnil; Daniel J. Bald; Rajesh Nagpal

doi:10.1117/12.544536

28 May 2004 Lithography-based automation in the design of program defect masks

George P. Vakanas, Saghir Munir, Edita Tejnil, Daniel J. Bald, Rajesh Nagpal

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.544536
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

In this work, we are reporting on a lithography-based methodology and automation in the design of Program Defect masks (PDM’s). Leading edge technology masks have ever-shrinking primary features and more pronounced model-based secondary features such as optical proximity corrections (OPC), sub-resolution assist features (SRAF’s) and phase-shifted mask (PSM) structures. In order to define defect disposition specifications for critical layers of a technology node, experience alone in deciding worst-case scenarios for the placement of program defects is necessary but may not be sufficient. MEEF calculations initiated from layout pattern data and their integration in a PDM layout flow provide a natural approach for improvements, relevance and accuracy in the placement of programmed defects. This methodology provides closed-loop feedback between layout and hard defect disposition specifications, thereby minimizing engineering test restarts, improving quality and reducing cost of high-end masks. Apart from SEMI and industry standards, best-known methods (BKM’s) in integrated lithographically-based layout methodologies and automation specific to PDM’s are scarce. The contribution of this paper lies in the implementation of Design-For-Test (DFT) principles to a synergistic interaction of CAD Layout and Aerial Image Simulator to drive layout improvements, highlight layout-to-fracture interactions and output accurate program defect placement coordinates to be used by tools in the mask shop.

Citation Download Citation

George P. Vakanas, Saghir Munir, Edita Tejnil, Daniel J. Bald, and Rajesh Nagpal "Lithography-based automation in the design of program defect masks", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.544536

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KEYWORDS

Computer aided design

Photomasks

Inspection

Optical proximity correction

Binary data

SRAF

Image processing

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