Advances in the use of plasma spraying for the fabrication of lightweight x-ray optics

Melville P. Ulmer; Michael Edward Graham; Semyon Vaynman; Matvey Farber; Jonathan I. Echt; Steve J. Varlese; Gary Emerson; Dean Baker

doi:10.1117/12.560421

18 October 2004 Advances in the use of plasma spraying for the fabrication of lightweight x-ray optics

Melville P. Ulmer, Michael Edward Graham, Semyon Vaynman, Matvey Farber, Jonathan I. Echt, Steve J. Varlese, Gary Emerson, Dean Baker

Author Affiliations +

Proceedings Volume 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II; (2004) https://doi.org/10.1117/12.560421
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

The next generation of X-ray observatories requires large area optics, with optimal angular resolution, minimal mass, and affordable fabrication techniques. Furthermore, for survey applications, a Ritchey-Chretien or polynomial design is called for, which precludes the use of foil or glass segment cone approximations. In order to meet these requirements, we have been exploring the use of plasma spraying as a replication technology to improve shape control and stiffness with a minimal mass penalty. Our main improvements to the basic concept is the lamination of the sprayed material with electroformed Ni on the outer surface along with the electroformed Ni inner surface of the mirror. We have also used metal-coated ceramic micro-spheres for the sprayed material and controlled the substrate temperature during spraying. These enhancements show the promise of making the technology viable. An up-to-date characterization of the properties of test pieces are presented.

Citation Download Citation

Melville P. Ulmer, Michael Edward Graham, Semyon Vaynman, Matvey Farber, Jonathan I. Echt, Steve J. Varlese, Gary Emerson, and Dean Baker "Advances in the use of plasma spraying for the fabrication of lightweight x-ray optics", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); https://doi.org/10.1117/12.560421

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