Paper
21 October 2004 Measurement of the Mueller matrix of an elliptical-mirror scatterometer
Neil Charles Bruce, Oscar Rodriguez-Herrera
Author Affiliations +
Proceedings Volume 5622, 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications; (2004) https://doi.org/10.1117/12.592176
Event: 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications, 2004, Porlamar, Venezuela
Abstract
We have recently developed a scatterometer which uses an elliptical mirror to direct the light scattered from a rough surface onto a CCD camera. This scatterometer is faster than the traditional arm based devices, and can measure the bi-dimensional scatter pattern. In the present work we present results for the calculation of the Mueller matrix of the elliptical mirror with the aim of using this information to correct the measured Mueller matrix for the instrumental contribution, to obtain the Mueller matrix of the scattering process.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Neil Charles Bruce and Oscar Rodriguez-Herrera "Measurement of the Mueller matrix of an elliptical-mirror scatterometer", Proc. SPIE 5622, 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications, (21 October 2004); https://doi.org/10.1117/12.592176
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KEYWORDS
Mirrors

Polarization

Reflection

Light scattering

Measurement devices

Scatter measurement

Scattering

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