Contamination removal from EUV multilayer using atomic hydrogen generated by heated catalyzer

H. Oizumi; H. Yamanashi; I. Nishiyama; K. Hashimoto; S. Ohsono; A. Masuda; A. Izumi; H. Matsumura

doi:10.1117/12.601136

6 May 2005 Contamination removal from EUV multilayer using atomic hydrogen generated by heated catalyzer

H. Oizumi, H. Yamanashi, I. Nishiyama, K. Hashimoto, S. Ohsono, A. Masuda, A. Izumi, H. Matsumura

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.601136
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

A rapid, damage-free method of removing carbon contamination from EUV multilayer has been developed that employs atomic hydrogen generated by a heated catalyzer consisting of a W wire. Test samples were prepared by contaminating Mo/Si multilayers with carbon using EB or synchrotron radiation (SR). The insertion of a thermal shield between the catalyzer and a sample prevented radiant heat from the catalyzer from damaging the sample during cleaning. Ex situ XPS measurements and measurements of the thickness of the carbon layer with optical thickness measurement systems showed that the new treatment completely removes carbon from multilayers. The EUV reflectivity of multilayers was measured before and after cleaning to assess any resulting damage. It was found that cleaning changed the reflectivity and the centroid wavelength only marginally, within the measurement error.

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H. Oizumi, H. Yamanashi, I. Nishiyama, K. Hashimoto, S. Ohsono, A. Masuda, A. Izumi, and H. Matsumura "Contamination removal from EUV multilayer using atomic hydrogen generated by heated catalyzer", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601136

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