Paper
8 December 2004 The second law of thermodynamics for advanced thin films
Ji-Tao Wang, David Wei Zhang, Wei-Feng Yu
Author Affiliations +
Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607267
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China
Abstract
In recent years, many advanced thin films had been successfully prepared under activated nonequilibrium conditions. However, based on classical thermodynamics the low-pressure diamond synthesis had been regarded as violating the second law of thermodynamics. After removing the “bug” hidden in classical concepts of thermodynamics, a new field of modern thermodynamics, nonequilibrium nondissipative thermodynamics, emerges in the equality part of the second law. The new progress in the second law of thermodynamics provides a firm theoretical base of calculating nonequilibrium phase diagrams for advanced thin films. Thermodynamic coupling in these systems has been discussed from both sides in physics and in mathematics. Our coupling model for diamond films growth was cited in the Journal Nature with a nice comment.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ji-Tao Wang, David Wei Zhang, and Wei-Feng Yu "The second law of thermodynamics for advanced thin films", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607267
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KEYWORDS
Thermodynamics

Diamond

Mathematics

Thin films

Chemical vapor deposition

Physics

Mathematical modeling

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